Antonio Facchetti, a leading materials scientist and chemist from the Georgia Institute of Technology in the United States, has accepted a position as a chair professor at the Hong Kong University of Science and Technology. He will be working within the university’s newly formed department of materials. Facchetti was recently honored with election to the US National Academy of Engineering for his impactful work in developing electronic materials and devices ready for commercial use. His research focuses on areas like semiconductors and dielectric materials for thin-film applications. This appointment signifies a significant addition to the Hong Kong University of Science and Technology’s research capabilities and its commitment to advancements in materials science. Facchetti's expertise promises to bolster the university’s innovation in the field. His move highlights the growing appeal of Hong Kong as a global hub for scientific research.